Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a62555ff12316a9a118542896b4c0af7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-1068 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-127 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78696 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1214 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1222 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-124 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L49-003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66742 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-786 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L49-00 |
filingDate |
2015-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b385ea6a8e8041ed4e2d2f8e6b49c95b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3dafe13e07a195608e44f614733e077c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a2a56c1bb18c640666d18716e417c15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51692880a45f4c6357cf9cc9b46b3f1d |
publicationDate |
2016-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2016197274-A1 |
titleOfInvention |
Thin film transistor and manufacturing method thereof, array substrate, display device |
abstract |
A thin film transistor and manufacturing method thereof, an array substrate and a display device are provided. In the manufacturing method of the thin film transistor, manufacturing an active layer includes: forming a germanium thin film, and forming pattern of the active layer through a patterning process; conducting a topological treatment on the germanium thin film with a functionalized element, so as to obtain the active layer ( 4 ) with topological semiconductor characteristics. The resultant thin film transistor has a higher carrier mobility and a better performance. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9704891-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10395849-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11204530-B2 |
priorityDate |
2014-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |