http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016177440-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bb1f5a047939f83cce008b654f7fdc8c |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-542 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0641 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3473 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-352 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3429 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-52 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-52 |
| filingDate | 2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14ff0437022cc68721c607e3565c5d8d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52f886e00ee1a4dd0602a538de1fd989 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92572a2765f460b9914d269e3976ac1b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eda4df8ffe99e558de84bf854f4343ac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0479b6cce06943fcc8404982b2154d4e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97f8ac924b3b0af1c9d9f2af03e0d4d3 |
| publicationDate | 2016-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2016177440-A1 |
| titleOfInvention | Method and Apparatus for the Multi-Layer and Multi-Component Coating of Thin Films on Substrates, and Multi-Layer and Multi-Component Coatings |
| abstract | The present invention pertains to a process for depositing multi-component and nanostructured thin films. Various parameters are monitored during the process to produce the structure of the thin films, on one hand the residence time of the gas mixture in the reactor is controlled by the pumping rate, on the other side to generate the plasma direct current (DC) or radio frequency (RF) sources are used, plus the combination of three unbalanced magnetrons allows alternative emission of elements that make up the multi-component and nanostructured films. The process is monitored by an optical emission spectrometer (EOE) and a Langmuir probe (SL), the EOE can follow the emission corresponding to the electronic transitions of atoms and molecules in the plasma. Emissions occur in the visible, infrared and ultraviolet domains. The relationships between spectral networks of different elements have been identified that ensure structural characteristics of thin films. Through SL, operating conditions have been identified by measuring the electron temperature and measuring the density of electrons. It was decided in the prototype to make this measurement at significantly important points in the process. |
| priorityDate | 2009-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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