http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016172144-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73d55b44219a84c850812a4488def924 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2602 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-06333 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-073 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-34 |
| filingDate | 2014-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5be5c4f25e10585a8a6a555ba1142c0e |
| publicationDate | 2016-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2016172144-A1 |
| titleOfInvention | Activation chamber and kit used in treatment device for lowering electron affinity, treatment device that contains said kit and is used to lower electronic affinity, photocathode electron-beam source, electron gun containing photocathode electron-beam source, free-electron laser accelerator, transmission electron microscope, scanning electron microscope, electron-beam holography microscope, electron-beam lithography device, electron-beam diffraction device, and electron-beam scanning device |
| abstract | This invention provides a treatment device for lowering electron affinity, said treatment device being capable of performing an EA surface treatment on a photocathode material or an EA surface retreatment on a photocathode, and an electron-beam device provided with said treatment device. An activation chamber ( 20 ) used in a treatment device for lowering electron affinity by vaporizing a surface-treatment material ( 30 ) and using the vaporized surface-treatment material ( 30 ) to perform an electron-affinity lowering treatment on a photocathode material ( 52 ) or an electron-affinity lowering retreatment on a photocathode ( 52 ), said activation chamber ( 20 ) being characterized by containing holes through which electrons can pass. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I696206-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9934926-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112420467-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11302507-B2 |
| priorityDate | 2013-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.