http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016161844-A1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-48
filingDate 2014-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca9ec45d973f08c63f3563cd36b0da7b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6484da1faa82bbe85f65ca6fba6d46a9
publicationDate 2016-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2016161844-A1
titleOfInvention Mask blank, method of manufacturing mask blank and method of manufacturing transfer mask
abstract There is provided a mask blank, including: a resist layer 2 formed by a chemically amplified resist; a protective layer 4 formed to coat the resist layer 2; and a buffer layer 3 provided between the resist layer 2 and the protective layer 4, wherein the protective layer 4 contains an acidic substance, a basic substance, and a salt generated by a reaction between the acidic substance and the basic substance, and the buffer layer 3 has a portion which is a surface layer portion of a pre-coated resist layer 20 before being coated by the protective layer 4, and in which the pre-coated resist layer 20 and the protective layer 4 are in contact with each other, and this portion is formed by receiving the acidic substance, the basic substance, and the salt moved from the protective layer 4.
priorityDate 2013-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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