http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016154307-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_66e061087b8b0ca4bda35df8e395be73 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-13 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-00 |
| filingDate | 2016-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e3a092408668ef462590d53d00b0597 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b276a3de6a2b4c58a7cee83368b65e87 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3939524edee901bc1dd4bb49c22a69bc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_772a181c9ff9b57d02dc014c6f2c0c4a |
| publicationDate | 2016-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2016154307-A1 |
| titleOfInvention | Photolithography for Making Electrochemical Measurements |
| abstract | An apparatus for electrochemical experimentation with an isolated microstructural region on a surface comprising a metal sample coated with a photoresist, a region of interest, an exposed region of photoresist and unexposed region of photoresist wherein the exposed region is created by light and creating a developed region of unexposed photoresist, and an adhesive strip with a first perforated window over the region of interest and a sealed waterproof container with a second larger perforated window over the first perforated window. A method for isolating microstructural regions for electrochemical experimentation comprising providing a metal sample, identifying regions of interest, coating the metal sample, selecting regions of interest, exposing with light and creating exposed photoresist and unexposed photoresist by laser lithography without a mask, and immersing the metal sample in a developer solution and creating developed regions of unexposed photoresist. |
| priorityDate | 2011-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.