| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a62555ff12316a9a118542896b4c0af7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-20 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C15-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C15-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G65-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G65-332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G65-48 |
| filingDate |
2013-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94f183c5a8271242535f184e75d49362 |
| publicationDate |
2016-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2016154305-A1 |
| titleOfInvention |
Polyether compound, method for preparing same and photoresist composition |
| abstract |
A polyether compound which is as shown in Formula (I), wherein R 1 is a polyether backbone of the polyether polyol; R 2 is hydrogen or C 1 ˜C 5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage. |
| priorityDate |
2013-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |