http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016076167-A1

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filingDate 2015-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f89b5b354e16541309900553819cf81
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publicationDate 2016-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2016076167-A1
titleOfInvention Rinsing and drying for electrochemical processing
abstract An electroplating/etch apparatus including a fluid jet and a dryer present over the tank containing the electrolyte for the electroplating/etch process. The fluid jet and the dryer remove excess liquids, such as electrolyte, from the component being plated or etched, e.g., working electrode. The working electrode is present on a holder that traverses from a first position within the tank during a plating or etch operation to a second position that is outside the containing the plating electrolyte. The fluid jet rinses the working electrode when the holder is in the second position, and the forced air dryer blows any remaining fluid from the fluid jet and the electrolyte from the working electrode into the tank.
priorityDate 2010-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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