| abstract |
There is provided a photosensitive composition containing a compound represented by Formula (I), and the Formula (I) is defined as herein, n n n n n n n n n n and chemical amplification resist composition containing the photosensitive composition, wherein the photosensitive composition further contains a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and a chemical amplification resist composition containing the photosensitive composition, wherein the photosensitive composition further contains a compound capable of generating an acid upon irradiation with an actinic ray or radiation. |