| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-423 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2015-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4d2c7e077c57c0afbfc2108cef2ed25
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7e7fe869587054c89f9f53804dcd084
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15e629d1360c8e1f662f425e892863e9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_433c5b8ea37cf08204681426fbc4578c |
| publicationDate |
2015-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015355551-A1 |
| titleOfInvention |
Systems for removing photoresists and methods of removing photoresists using the same |
| abstract |
A system for removing a photoresist includes a solution storage configured to store a preliminary photoresist removal solution, a solution activation unit configured to convert the preliminary photoresist removal solution from the solution storage into an activated photoresist removal solution, and a photoresist removal unit configured to receive the activated photoresist removal solution from the solution activation unit, and configured to load a substrate including a photoresist pattern formed thereon. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111198482-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I603168-B |
| priorityDate |
2014-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |