| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2013-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c7740cff558a2d38ef00192c8f05a98
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fdaeb52bc74bb137aaf68816f5474a7b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c590ccd4a99335722ec5fd5e8b5cb21c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5788eb47c649c7d10534ceed94ff9cc |
| publicationDate |
2015-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015344739-A1 |
| titleOfInvention |
Aqueous dispersion for chemical mechanical polishing, and chemical mechanical polishing method |
| abstract |
A chemical mechanical polishing aqueous dispersion includes colloidal silica (A), an anionic water-soluble polymer (B), and at least one type of an alkanolamine salt (C) selected from the group consisting of an alkyl sulfate and an alkyl ether sulfate, the chemical mechanical polishing aqueous dispersion having a pH of 1 to 4. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10507563-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111587473-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3936582-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10294399-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018190506-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10253216-B2 |
| priorityDate |
2012-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |