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filingDate 2015-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32114ad69a306fc76da1c82a0f0c1d7e
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publicationDate 2015-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2015340282-A1
titleOfInvention Conductive interconnect structures incorporating negative thermal expansion materials and associated systmes, devices, and methods
abstract Semiconductor devices having interconnects incorporating negative expansion (NTE) materials are disclosed herein. In one embodiment a semiconductor device includes a substrate having an opening that extends at least partially through the substrate. A conductive material having a positive coefficient of thermal expansion (CTE) partially fills the opening. A negative thermal expansion (NTE) having a negative CTE also partially fills the opening. In one embodiment, the conductive material includes copper and the NTE material includes zirconium tungstate.
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