| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d8d3bd9e9e9add65a261f24da2d0877b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2a447c3a9902bfc9cd40b97515dc9546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_df9c2933831630916f4d660c7d354392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_54eb880b816f94b05a4a64a2d32b1240 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-09 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| filingDate |
2015-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62a510abb3c2b03cf180be5003ac80ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97e773f221dada50a76e19d4befd056e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee87336aea81a3839edfb5fa879f7024
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8500c14ba02fc6c1448e58fe47fa0d76 |
| publicationDate |
2015-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015340246-A1 |
| titleOfInvention |
Method of forming patterns and method of manufacturing integrated circuit device using the same |
| abstract |
A method of forming patterns may use an organic reflection-preventing film including a polymer having an acid-liable group. A photoresist film is formed on the organic reflection-preventing film. A first area selected from the photoresist film is exposed to generate an acid in the first area. Hydrophilicity of a first surface of the organic reflection-preventing film facing the first area of the photoresist film may be increased. The photoresist film including the exposed first area is developed to remove a non-exposed area of the photoresist film. The organic reflection-preventing film and a target layer are anisotropically etched by using the first area of the photoresist film as an etch mask. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10062571-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10032633-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I801853-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11740553-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11662663-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020102164-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11226552-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017213731-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111123651-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11121136-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11573492-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11393694-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11610898-B2 |
| priorityDate |
2014-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |