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publicationDate 2015-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2015325411-A1
titleOfInvention Directional treatment for multi-dimensional device processing
abstract Embodiments of the disclosure include apparatus and methods for modifying a surface of a substrate using a surface modification process. The process of modifying a surface of a substrate generally includes the alteration of a physical or chemical property and/or redistribution of a portion of an exposed material on the surface of the substrate by use of one or more energetic particle beams while the substrate is disposed within a particle beam modification apparatus. Embodiments of the disclosure also provide a surface modification process that includes one or more pre-modification processing steps and/or one or more post-modification processing steps that are all performed within one processing system.
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