http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015311042-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_985f1bf0df4204078e687f8417dc5871 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6719 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32798 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32458 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2014-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_199bbd4416a64c408178e65d9aaef549 |
| publicationDate | 2015-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2015311042-A1 |
| titleOfInvention | Substrate treating apparatus |
| abstract | Provided is a substrate treating apparatus which treats a substrate using plasma. The substrate treating apparatus includes a processing chamber having an inner space in which process treatment is performed on a substrate, a cover member coupled to the processing chamber by a hinge part and rotating upwardly and downwardly with respect to the hinge part to open/close the processing chamber, and a close preventing member disposed on a sidewall of the cover member to prevent the cover member from being closed during upward rotation of the cover member. n The substrate treating apparatus prevents a cover member opening/closing a processing chamber from being sudden closed to secure operator's safety. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108257892-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110299301-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108257892-B |
| priorityDate | 2014-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.