patent/US-2015307989-A1

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015307989-A1

Outgoing Links

Predicate	Object
assignee	http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_332f0cf90d46c84d628aed0b4c9b5349 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b59d04cdcacdb8bae73072c956f2a924
classificationCPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544
classificationIPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
filingDate	2012-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_996f74716dbb5b63d3398d02ace5c3bb
publicationDate	2015-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	US-2015307989-A1
titleOfInvention	Atomic layer deposition method and apparatuses
abstract	A method includes operating an atomic layer deposition reactor configured to deposit material on at least one substrate by sequential self-saturating surface reactions, and using dry air in the reactor as purge gas.
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Total number of triples: 176.