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filingDate 2015-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2015-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2015286143-A1
titleOfInvention Process for manufacturing resist composition and patterning process
abstract This is to provide a process for manufacturing a resist composition which can prepare a resist composition lowered in coating defects, andn the manufacturing process is a process for manufacturing a resist composition to be used in a process for manufacturing a semiconductor apparatus, the process comprising the steps of: cleaning a manufacturing apparatus for a resist composition with a cleaning solution; analyzing the cleaning solution taken out from the manufacturing apparatus; repeating the step of cleaning and the step of analyzing until a concentration of metal components contained in the cleaning solution becomes 5 ppb or less; and manufacturing the resist composition by using the manufacturing apparatus after the step of repeating.
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