| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-185 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-0254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D153-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F297-026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-107
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D153-00 |
| filingDate |
2015-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bda610e3d51ab514daf7538f668089e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b40ada315d0789564192dceb9481ef6d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8480941479d47c204fa40dcbe910dc5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f8e6cce869d00b71c3f5f764380c51a |
| publicationDate |
2015-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015225601-A1 |
| titleOfInvention |
Composition for pattern formation, and pattern-forming method |
| abstract |
A composition for pattern formation includes a block copolymer and a solvent. The block copolymer is capable of forming a phase separation structure through directed self-assembly. The block copolymer includes a first block and a second block. The first block includes a first repeating unit which includes at least two silicon atoms. The second block includes a second repeating unit which does not include a silicon atom. A sum of the atomic weight of atoms constituting the first repeating unit is no greater than 700. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10875236-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017042312-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020058281-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-3085956-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10691019-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11078318-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-3041119-A1 |
| priorityDate |
2014-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |