| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2013-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9910d2a9f014e2c531f5fe4e48ac8589
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_523e5f0c7418f04134cf08ce1d859e56 |
| publicationDate |
2015-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015210891-A1 |
| titleOfInvention |
Polishing composition, method for manufacturing polishing composition, and method for manufacturing polishing composition liquid concentrate |
| abstract |
A polishing composition contains silicon dioxide, a water-soluble polymer, and water. An adsorbate containing at least part of the water-soluble polymer is adsorbed on the silicon dioxide. The adsorbate is contained in a concentration of 4 ppm by mass or more in terms of carbon. A percentage of the concentration of the adsorbate in terms of carbon relative to a total carbon concentration in the polishing composition is 15% or more. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10077380-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3406684-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10344185-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11791164-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10344184-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10249486-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10190024-B2 |
| priorityDate |
2012-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |