http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015185604-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2014-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85e6160cb29ccb2a7e049f6c42d93ca9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55ee5dbb707da45e0d92e2bb8d709ade http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9163d5763457518986267c7f5364aae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5229c97b5cfde33a29e4cf293e1d0e7f |
| publicationDate | 2015-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2015185604-A1 |
| titleOfInvention | Photosensitive resin composition and method for producing resist pattern |
| abstract | The present invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound having at least one ethylenically unsaturated double bond per molecule (B); a photo radical polymerization initiator having a keto oxime ester structure (C); and a compound represented by the Formula (1) or (2) below (D); wherein the content of the photo radical polymerization initiator (C) is 0.5 to 5 times the content of the compound (D), and the content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the compound (B) is 3 to 20 parts by mass. In Formula (1), the six R 1 s each independently represent a hydrogen atom or an electron-donating group, and n represents 0 or 1. In Formula (2), the six R 2 s each independently represent a hydrogen atom or an electron-donating group, and m represents 0 or 1. n n n n n n n n n n By use of the photosensitive resin composition of the present invention, formation of a resist pattern having excellent resolution is possible even without using an oxygen inhibition layer. By the method for producing a resist pattern of the present invention, formation of a resist pattern having excellent resolution is possible even without using an oxygen inhibition layer. |
| priorityDate | 2013-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 298.