| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_59ec405ac13fccbf6de02759bf5ca851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4be204c3521b64120c4d164c1e6eb48c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ab20d6c26dfe961d7cebf2d5a15e2e6b |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-38 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-38 |
| filingDate |
2014-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19a170f3bef1ebf4d6d16424c7bed65e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_720a16f2df7f735f13eae56da258d07e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66388051483be477fad45b55815b3a69 |
| publicationDate |
2015-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015160550-A1 |
| titleOfInvention |
Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device |
| abstract |
Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11735421-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10217635-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019179225-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021531502-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108351596-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11270884-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10963614-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023028729-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109426065-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110767601-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11448955-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110767601-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021033959-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015132875-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11385539-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11169449-B2 |
| priorityDate |
2013-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |