| abstract |
A method of reducing defects of a semiconductor substrate whereby the substrate is rinsed with an aqueous composition containing a gemini additive of the general formula I after the development of a photoresist or a photolithographic mask n n n n n n n n n n n n wherein n X is a divalent group, R 1 , R 2 , R 3 and R 4 are substituted or unsubstituted monovalent groups, n is an integer from 1 to 5, or 1 to 10000 depending on R 3 and R 4 , z is an integer, which is chosen so that the overall surfactant is electrically uncharged, and Z is a counter-ion. |