http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015155164-A1

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filingDate 2015-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5289a057f8d096312992fb53d9282632
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publicationDate 2015-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2015155164-A1
titleOfInvention Patterned mask using cured spin-on-glass composition
abstract Provided herein are methods for depositing a spin-on-glass composition over an imprinted resist; curing the spin-on-glass composition to form a cured spin-on-glass composition; and forming a patterned mask by etching the cured spin-on-glass composition, the resist, and an underlying mask composition, wherein the patterned mask comprises features of the cured spin-on-glass composition atop the mask composition, and wherein curing the spin-on-glass composition is configured to prevent shifting or toppling of the spin-on glass composition from atop the mask composition while forming the patterned mask.
priorityDate 2012-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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