| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a62555ff12316a9a118542896b4c0af7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133514 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-00 |
| filingDate |
2013-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a111fba78565e09d0aced68f846ffc2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bacf11190f50e8ce127cba828c87cce3 |
| publicationDate |
2015-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015153645-A1 |
| titleOfInvention |
Photosensitive oligomer for photosensitive resist, method for preparing the same, and negative photosensitive resist resin composition |
| abstract |
A photosensitive oligomer for photosensitive resist comprising unsaturated double-bond group and flexible group. The monomers or compounds for synthesizing the photosensitive oligomer include unsaturated double-bond containing organic acid-based monomers, unsaturated double-bond containing organic ester-based monomers, unsaturated double-bond containing organic acid chloride/ethylene-based monomers, unsaturated double-bond containing alcohol-based compounds, and flexible group-containing silane/ether-based compounds. The present invention further provides a negative photosensitive resist resin composition comprising the photosensitive oligomer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11053396-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112694557-A |
| priorityDate |
2013-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |