| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3365
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31705 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32412 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2013-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_715aac018496ecbf13599f32d6c9f911
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7160f9c530496ed49d3f7ea7066f5c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54a079a3317dc2906c81564c7a76a541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_551d4bd20886662192fc28125b340d28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4df1da9cb40f94b14e5c0c4e1ecb29e5 |
| publicationDate |
2015-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015132929-A1 |
| titleOfInvention |
Method for injecting dopant into substrate to be processed, and plasma doping apparatus |
| abstract |
Provided is a method for injecting a dopant into a substrate to be processed. A method in one embodiment of the present invention includes: (a) a step for preparing, in a processing container, a substrate to be processed; and (b) a step for injecting a dopant into the substrate by supplying a doping gas containing AsH 3 , an inert gas, and H 2 gas to the inside of the processing container, and applying plasma excitation energy to the inside of the processing container. In the step of injecting the dopant, the ratio of hydrogen partial pressure to the gas total pressure in the processing container is set within the range of 0.0015-0.003. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114561632-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113025970-A |
| priorityDate |
2012-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |