http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015079283-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8c554eb1402af3dd2c497952e0d56be1 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4481 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 |
| filingDate | 2013-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1633eaa143fe1f763a6eadbf03244e4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ab258cc4da26db59299a9252b13d2f6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_956d45968a8a8a3da62a1a501257ce31 |
| publicationDate | 2015-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2015079283-A1 |
| titleOfInvention | Apparatus and method to deposit doped films |
| abstract | A deposition apparatus comprising a vaporizer chamber configured to hold a solid precursor of a dopant element therein. Gas input and output lines are connected to the vaporizer chamber and flow rate controllers are coupled to each of the gas input and output lines. The flow rate controllers are configured to adjust a rate of carrier gas flow into and out of the vaporizer chamber through the gas input and output lines. The vaporizer chamber has a temperature controller and pressure controller to produce vapors of the solid precursor in the vaporizer chamber that can be carried with the carrier gas flow through the output line. |
| priorityDate | 2013-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.