http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015076491-A1

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publicationDate 2015-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2015076491-A1
titleOfInvention Semiconductor device and manufacturing method thereof
abstract A transistor having high field-effect mobility is provided. A transistor having stable electrical characteristics is provided. A transistor having low off-state current (current in an off state) is provided. Alternatively, a semiconductor device including the transistor is provided. The semiconductor device includes a first insulating film, an oxide semiconductor film over the first insulating film, a second insulating film over the oxide semiconductor film, and a conductive film overlapping with the oxide semiconductor film with the first insulating film or the second insulating film provided between the oxide semiconductor film and the conductive film. The composition of the oxide semiconductor film changes continuously between the first insulating film and the second insulating film.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11043600-B2
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