| abstract |
A photoresist composition includes a polymer with repeat units having the structure n n n n n n n n n n wherein each occurrence of R 1 and R 2 is independently hydrogen, unsubstituted or substituted C 1-18 linear or branched alkyl, unsubstituted or substituted C 3-18 cycloalkyl, unsubstituted or substituted C 6-18 aryl, or unsubstituted or substituted C 3-18 heteroaryl; and R 1 and R 2 are optionally covalently linked to each other to form a ring that includes —R 1 —C—R 2 —; each occurrence of Ar 1 , Ar 2 , and Ar 3 is independently an unsubstituted or substituted C 6-18 arylene, or unsubstituted or substituted C 3-18 heteroarylene. In addition to the polymer, the photoresist composition includes a photoactive component selected from photoacid generators, photobase generators, photoinitiators, and combinations thereof. |