http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015007766-A1

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filingDate 2014-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5b730c161f1829d906c4991c1382546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83c2011003da8d34d2ec5cb65d5bed41
publicationDate 2015-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2015007766-A1
titleOfInvention Vapor phase growth apparatus and vapor phase growth method
abstract A vapor phase growth apparatus of an embodiment includes: a reaction chamber; a gas supply path connected to an organic metal supply source at a first connection, the gas supply path being connected to a carrier gas supply source, the gas supply path supplies a process gas including organic metal and a carrier gas into the reaction chamber; a gas discharge path connected to the organic metal supply source at a second connection, the gas discharge path discharges the process gas to the outside of the apparatus; a first mass flow controller and a first adjustment device provided at the gas supply path; a second adjustment device provided at the gas discharge path; and a shortcut path connecting the gas supply path to the gas discharge path. One of the first and the second adjustment device is a back pressure regulator, and the other is a mass flow controller.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10438795-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018203256-A1
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priorityDate 2013-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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