| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_404ad0935824c097ae3f26b606020534 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2014-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ad19b877f15e2a62da75df8657227c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb7e17bea6850bda8a370cde504cb4ab |
| publicationDate |
2014-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014356789-A1 |
| titleOfInvention |
Fluorinated photopolymer with integrated anthracene sensitizer |
| abstract |
A method of patterning a device comprises providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit having an anthracene-based sensitizing dye. The photopolymer has a total fluorine content in a range of 15 to 60% by weight. The photopolymer layer is exposed to patterned light and contacted with a developing agent to remove a portion of exposed photopolymer layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photopolymer. The developing agent comprises at least 50% by volume of a fluorinated solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3238288-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10289000-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10739680-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10503074-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10503065-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11309529-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014356788-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016105473-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10838302-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10854854-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9500948-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10580987-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107251190-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107251190-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10468637-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10325970-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9991114-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9958778-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9899636-B2 |
| priorityDate |
2013-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |