Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate |
2014-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbdae697df2ea8f34a395e20f6b520a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bb5204a4cf685121c18968954cec8a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70f832b8abb5fc1dfa0553f2d633c3d1 |
publicationDate |
2014-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2014302438-A1 |
titleOfInvention |
Resist composition, resist pattern-forming method, and resist solvent |
abstract |
A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11150554-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018299778-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11747725-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10866514-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021141308-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018299773-A1 |
priorityDate |
2013-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |