http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014295617-A1

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filingDate 2014-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2014-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2014295617-A1
titleOfInvention Method for manufacturing semiconductor device
abstract A highly reliable semiconductor device which includes a transistor including an oxide semiconductor is provided. In the semiconductor device including a bottom-gate transistor including an oxide semiconductor layer, a stacked layer of an insulating layer and an aluminum film is provided in contact with the oxide semiconductor layer. Oxygen doping treatment is performed in such a manner that oxygen is introduced to the insulating layer and the aluminum film from a position above the aluminum film, whereby a region containing oxygen in excess of the stoichiometric composition is formed in the insulating layer, and the aluminum film is oxidized to form an aluminum oxide film.
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Total number of triples: 26.