| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_175351044f02b424b05da196df66f32d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6a162b65402a9a79580e3ae31dcbf3fa |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01G9-2059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-542
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-13 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01G9-2022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01G9-2031 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01G9-20 |
| filingDate |
2014-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_017ebe0e14d29c6350238ab5d3eca285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_742089c854ac6649e289abda04674db8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd99880383bb3dbaeff129482e51789b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f6608b947b4e3426f64af6bb15c4d99
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8640722a7a2a6e4f4a4e6adbe52b212 |
| publicationDate |
2014-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014251427-A1 |
| titleOfInvention |
Photoelectrode for dye-sensitized solar cell, method for manufacturing thereof and dye-sensitized solar |
| abstract |
A photoelectrode for a dye-sensitized solar cell includes, a sensitizer supported in a functional semiconductor layer of a photoelectrode structure provided with the functional semiconductor layer on a transparent conductive layer of a translucent substrate made by forming the transparent conductive layer on a plastic translucent support, in which the functional semiconductor layer includes a roll-pressed layer which is being in contact with the transparent conductive layer and roll-pressing traces extending in parallel with a roll-pressing treatment direction on a surface of the roll-pressed layer, and a surface roughness Ra in a first direction which is in parallel with the roll-pressing treatment direction is smaller than a surface roughness Ra in a second direction which is orthogonal to the first direction on a surface of the functional semiconductor layer. |
| priorityDate |
2011-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |