| abstract |
A gas processing device is disclosed that makes it possible to appropriately control the frictional resistance between a holding mat and a casing. A gas processing device ( 1 ) includes a processing structure ( 20 ), a casing ( 40 ) made of a metal and housing the processing structure ( 20 ), and a holding mat ( 10 ) formed of inorganic fibers and placed between the processing structure ( 20 ) and the casing ( 40 ), an inner surface ( 41 ) of the casing ( 40 ) and an outer surface ( 11 ) of the holding mat ( 10 ) coming in contact with each other through an adhesive layer ( 12 ) that includes a compound that includes a structural unit represented by a general formula (I). n n n n n n n n n n wherein R 1 are independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, a phenyl group, or a hydroxyl group, and n is an integer equal to or larger than 1. |