| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_05350691c89c730194925ad6a2292325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_250af0d5e8ae652cd9c5081150ea0299
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de178150154cb524a9304bf9799b295d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0206 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2012-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_248e5e38504d2ab60d9e59517083b1f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37cdfeed361f3a3f543c16d97f2bf3b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a26e5695f9d1b5e774a3b4a51e4fad0 |
| publicationDate |
2014-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014234783-A1 |
| titleOfInvention |
Rinse solution for lithography and pattern formation method employing the same |
| abstract |
The present invention provides a rinse solution for lithography and a pattern formation method using the solution. They can improve the pattern collapse, surface roughness and surface defects. The solution contains at least a sulfonic acid a nonionic surfactant having an alkyleneoxy group and water. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10451974-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10468250-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-116120998-A |
| priorityDate |
2011-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |