| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2dd9be80d77ae042c1728d9fbee2a49c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-13 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-503
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32596
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32577
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32394 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-503 |
| filingDate |
2014-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0efe5dd1bad57646877771a64429b3e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c99d2e2d798f03304c6a185c667adfc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8a91a2cf92bd500ed8f7f53040f5fdf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce855eedd7cefe1de201057189ab8f17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_680b2605926d5f7f68b4cb304967f2b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5cf4b868502f2abd707472a01a59325e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca1dae28a2494cd7824bd9309911a987 |
| publicationDate |
2014-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014227464-A1 |
| titleOfInvention |
Multiple anode plasma for cvd in a hollow article |
| abstract |
A method and apparatus for plasma enhanced chemical vapor deposition to an interior region of a hollow, tubular, high aspect ratio workpiece are disclosed. A plurality of anodes are disposed in axially spaced apart arrangement, to the interior of the workpiece. A process gas is introduced into the region. A respective individualized DC or pulsed DC bias is applied to each of the anodes. The bias excites the process gas into a plasma. The workpiece is biased in a hollow cathode arrangement. Pressure is controlled in the interior region to maintain the plasma. An elongated support tube arranges the anodes, and receives a process gas tube. A current splitter provides a respective selected proportion of a total current to each anode. One or more notch diffusers or chamber diffusers may diffuse the process gas or a plasma moderating gas. Plasma impedance and distribution may be controlled using various means. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10710820-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10112785-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11560276-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023034972-A1 |
| priorityDate |
2009-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |