| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-733
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2014-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_134bd9f98bfb5deee9c3e1acccdfc39d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1037a749a7d25144305b690cd1dbda52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed5e66026f6a20648fedeb1260e85728
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6af8dd7c0cc87e9165369a4681065f |
| publicationDate |
2014-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014212811-A1 |
| titleOfInvention |
Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device |
| abstract |
A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation, (C) a resin having one or more groups selected from the specific group as defined in the specification and (D) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9798234-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10890847-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016252815-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018321589-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020081483-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11480874-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016327862-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3953767-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9465298-B2 |
| priorityDate |
2011-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |