Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
filingDate |
2014-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f00b304bd547a0fac0f03948f2310cbb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8c71d33c77b0cfbfdbf78e05c311a43 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11e1e95573cdbb69e17880f0542427b6 |
publicationDate |
2014-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2014205956-A1 |
titleOfInvention |
Method for forming resist pattern |
abstract |
A method for forming a negative type resist pattern having a high residual film rate of exposed areas of a resist film by heating an exposed resist film and subjecting it to patterning by negative type development with a developing solution containing an organic solvent, in which a resist composition containing a high-molecular weight compound having a constituent unit represented by a particular general formula. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10921710-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10018913-B2 |
priorityDate |
2013-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |