| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f8dfd5447275bea4b74d914224d6f207 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02049
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate |
2013-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_469adb557fe4e762a47d5752d9c0671f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1fd2dc23f295fa39c50b87d8e9e9c39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc7e8374fcbfb1e4e1e157f73014b001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fae7b85a20952f3ba76742ecd8e423a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6081bb5ca977cf5795e03cfb7fbcffc |
| publicationDate |
2014-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014148014-A1 |
| titleOfInvention |
Substrate processing apparatus and substrate processing method |
| abstract |
A substrate processing apparatus and method includes a chamber, a remote plasma source outside the chamber to provide activated ammonia and activated hydrogen fluoride into the chamber, and a direct plasma source to provide ion energy to a substrate inside the chamber. The plasma source includes ground electrodes extending in a first direction on a first plane perpendicularly spaced apart from a plane on which the substrate is disposed and defined by the first direction and a second direction perpendicular to the first direction and power electrodes disposed between the ground electrodes, extending in the first direction parallel to each other and receiving power from an RF power source to generate plasma between adjacent ground electrodes. The activated ammonia and the activated hydrogen fluoride are supplied on the substrate through a space between the power electrode and the ground electrode. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012247390-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021108294-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017294319-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I782220-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I817756-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11211231-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11721542-B2 |
| priorityDate |
2012-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |