Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f395b7ab9dbfb7a96af77c0d25cf5b33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5239dae8df3d9404d985025f071c6024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_583171e90055583bf625fe03f958232e |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-32 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-12 |
filingDate |
2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f159f4b3d36eacd76cad909f4da8bcc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16574b00060d75017dc8fca8df41d73f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ccbf06e9278e2f2f41327b748ce7b3d |
publicationDate |
2014-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2014124804-A1 |
titleOfInvention |
Hetero-substrate, nitride-based semiconductor light emitting device, and method for manufacturing the same |
abstract |
A hetero-substrate, a nitride-based semiconductor light emitting device, and a method of manufacturing the same are provided. The hetero-substrate may include a substrate including a silicon semiconductor, a buffer layer disposed on the substrate, a first semiconductor layer disposed on the buffer layer and including a nitride semiconductor, a second semiconductor layer disposed on the first semiconductor layer and including a first conductive type nitride semiconductor having a first doping concentration, and a stress control structure disposed between the first semiconductor layer and the second semiconductor layer and including at least one stress compensation layer and at least one third semiconductor layer including a first conductive type nitride semiconductor having a second doping concentration that is the same or lower than the first doping concentration. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015187876-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9159788-B2 |
priorityDate |
2012-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |