| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02554 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66969
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-564
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B23-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B23-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28194
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
2013-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21747acfb77b0d181ab4dff0d66658d4 |
| publicationDate |
2014-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014102877-A1 |
| titleOfInvention |
Method for using sputtering target and method for manufacturing oxide film |
| abstract |
A plasma space containing an ionized inert gas is formed in contact with a deposition surface and a surface of a sputtering target containing a polycrystalline oxide including a plurality of crystal grains with randomly oriented c-axes. A flat-plate-like sputtered particle is separated from a cleavage plane corresponding to a-b planes of the plurality of crystal grains by collision of the ionized inert gas with the surface of the sputtering target. The flat-plate-like sputtered particle is transferred to the deposition surface through the plasma space with its flat-plate-like shape substantially maintained. The flat-plate-like sputtered particle and another flat-plate-like sputtered particle charged with the same polarity repel each other and are deposited on the deposition surface so as to be adjacent to each other on a plane such that the c-axes are substantially perpendicular to the deposition surface. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015255611-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11705337-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11581183-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015021593-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9847431-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10014354-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10707283-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017278916-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8952365-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10615201-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11610773-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11785835-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111321372-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11393995-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10886351-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10084096-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9391146-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9859117-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9543444-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11469113-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11527421-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112349792-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10032927-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11404516-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11749555-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170110503-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9761733-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10916433-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013140522-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11322700-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109618305-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10388533-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9287352-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9771272-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016067122-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017069696-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014042014-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11482625-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10651043-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10236330-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11756803-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11744111-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11380860-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11361978-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10557192-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11476431-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018366328-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11694912-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9246138-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9583632-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102013488-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11462417-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9793414-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9508864-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10461197-B2 |
| priorityDate |
2012-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |