| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_14ba71eccbb5f65a22b78f39b3c6ffc3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K10-468
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-233 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-621
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76805 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
2013-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a90f71fab6dd0e86105cab80932d6bd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9d4308922231676cdc5e18b4af07142
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f56c25dd634949e67839918c6e8b3c9a |
| publicationDate |
2014-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014087552-A1 |
| titleOfInvention |
Method of forming a conductive polymer microstructure |
| abstract |
The present disclosure relates to microstructure devices, in which a conductive pattern is formed on the basis of a conductive polymer material. In order to avoid the deposition and processing of the sacrificial materials and reduce a negative influence of the lithography process on sensitive conductive polymer materials a one-layer patterning sequence is proposed, in which a trench pattern is formed in a dielectric material that is subsequently filled with the conductive polymer material. |
| priorityDate |
2012-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |