| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-90
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-314
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-332 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B44C1-227
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B44C1-22 |
| filingDate |
2013-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e60d887388d0c83cc7b802ce039dd8ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_828e44f905150668e0a8e8ce1165781b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a266b22aa8bfef86c6446fd65fed4af5 |
| publicationDate |
2014-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014048512-A1 |
| titleOfInvention |
Composition for forming resist underlayer film and pattern-forming method |
| abstract |
A composition for forming a resist underlayer film includes a polymer having a repeating unit represented by a following formula (1), and a solvent. R 1 represents a hydroxy group, or the like. n is an integer of 0 to 5. X represents a divalent hydrocarbon group having 1 to 20 carbon atoms or an alkanediyloxy group having 1 to 20 carbon atoms. m is an integer of 1 to 7. A sum of m and n is no greater than 7. R 2 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms. R 3 represents an alicyclic group having 4 to 20 carbon atoms or an arylene group having 6 to 30 carbon atoms. A part or all of hydrogen atoms included in the alicyclic group or the arylene group represented by R 3 are unsubstituted or substituted. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11688570-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016187778-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014220783-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9607849-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11762292-B2 |
| priorityDate |
2011-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |