http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014038103-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_105547d87faa78f483be006865026692 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2013-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6aaf1c01a87f1057e0f6e4ed4bc2c903 |
| publicationDate | 2014-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2014038103-A1 |
| titleOfInvention | Lithography using photoresist with photoinitiator and photoinhibitor |
| abstract | Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a photoinitiator and a photoinhibitor. The photoinitiator may be effective to generate a first reactant upon the absorption of at least one photon of a particular wavelength of light. The first reactant may be effective to render the resin soluble or insoluble in a photoresist developer. The photoinhibitor may be effective to generate a second reactant upon the absorption of at least one photon of the particular wavelength of light. The second reactant may be effective to inhibit the first reactant. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015331330-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016042171-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9304410-B2 |
| priorityDate | 2011-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.