| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_115673df9607cc87a1fb07a6030f7f2f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4e6822538a3d157b1e9870ab712aafc3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_648ffc0cd50fe41ddb2dbbac1b11acf4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_39d46b15254e99badcf146f489f05cc3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F3-06 |
| filingDate |
2012-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3887728e8de3bcb9a1d113aeafb8d1f1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba47334964758662e0ffae300fdbb6dd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba4895d082411668ab13d917438d475c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4c60dd745dcb88a8a7d343fcf29367c |
| publicationDate |
2014-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014014872-A1 |
| titleOfInvention |
Polishing composition and polishing method |
| abstract |
Disclosed is a polishing composition containing a pH-lowering substance and a pH-buffering agent. The difference in absolute value between the pH of the polishing composition immediately after adding a 31% by weight hydrogen peroxide solution thereto at 5.16 g per 100 g of the polishing composition and the pH of the polishing composition after leaving to stand for eight days therefrom is 0.5 or less. Also disclosed is another polishing composition containing a pH-lowering substance and a pH-controlling agent. In comparison to the amount of a basic substance in the polishing composition immediately after adding a 31% by weight hydrogen peroxide solution thereto at 5.16 g per 100 ml of the polishing composition, the amount of a basic substance in the polishing composition after leaving to stand for eight days therefrom is increased by no less than 0.1 mM. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10647900-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10217645-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016200943-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016027657-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021009859-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10526508-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11168239-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017040571-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019093056-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11162057-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014011362-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10703935-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018230334-A1 |
| priorityDate |
2011-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |