| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_242789508fcc9b52c84a82ac211a6774 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-1063 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5329
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76829
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D129-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D129-04 |
| filingDate |
2013-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bbd7a78249b8465feac22869770afc8d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c52646d069f1265627c1b9f2305c8614
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_667b2afd892ece4256d87ce753c45eda
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce511e4a28a0f254c6eba4fb068d4e60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b37fb7cccbd894ec3b7b0b4407ee988
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_201cc0a720baad2e700022d688141b34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f9f7239ace7e82653cdb81f82899044 |
| publicationDate |
2013-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013338305-A1 |
| titleOfInvention |
Methods for Coating a Substrate with an Amphiphilic Compound |
| abstract |
Methods of modifying a patterned semiconductor substrate are presented including: providing a patterned semiconductor substrate surface including a dielectric region and a conductive region; and applying an amphiphilic surface modifier to the dielectric region to modify the dielectric region. In some embodiments, modifying the dielectric region includes modifying a wetting angle of the dielectric region. In some embodiments, modifying the wetting angle includes making a surface of the dielectric region hydrophilic. In some embodiments, methods further include applying an aqueous solution to the patterned semiconductor substrate surface. In some embodiments, the conductive region is selectively enhanced by the aqueous solution. In some embodiments, methods further include providing the dielectric region formed of a low-k dielectric material. In some embodiments, applying the amphiphilic surface modifier modifies an interaction of the low-k dielectric region with a subsequent process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9012263-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015118791-A1 |
| priorityDate |
2007-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |