http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013328133-A1

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823412
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-088
filingDate 2013-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_354dc6d9b5008589bd341b8076cb6a7d
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publicationDate 2013-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2013328133-A1
titleOfInvention Integrated circuit device with transistors having different threshold voltages
abstract Integrated circuit device with transistors having different threshold voltages and methods of forming the device are provided. The device may include the first, second and third transistors having threshold voltages different from each other. The first transistor may be free of a stacking fault and the second transistor may include a stacking fault. The concentration of the channel implant region of the third transistor may be different from the concentration of the channel implant region of the first transistor.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022216206-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I548069-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9064888-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015001594-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11527536-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015228645-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015097197-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9721947-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11410993-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10553580-B2
priorityDate 2012-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.