http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013327921-A1

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publicationDate 2013-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2013327921-A1
titleOfInvention Image device and methods of forming the same
abstract A method of forming of an image sensor device includes a substrate having a pixel region and a periphery region. A plurality of first trenches is etched in the periphery region. Each of the first trenches has a depth D 1 . A mask layer is formed over the substrate. The mask layer has a plurality of openings in the pixel region. A spacer is formed in an interior surface of each opening. A plurality of second trenches is etched through each opening having the spacer in the pixel region. Each of the second trenches has a depth D 2 . The depth D 1 is larger than the depth D 2 .
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