Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_39ed3384a89336c5e41e1e57b6558462 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88bab0e9ec427c9ee689594eeb3582f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5a449227d7f1bb1d2ec49cccd132a53d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66545 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-845 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 |
filingDate |
2012-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a98a3af0fe6c816fa91ad46d30b7aeac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_605d3f4233764daf461b26d50909ab09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_921b0e99d3224e72a37f4a04077e5a24 |
publicationDate |
2013-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2013307079-A1 |
titleOfInvention |
Etch resistant barrier for replacement gate integration |
abstract |
Semiconductor devices and methods of their fabrication are disclosed. One device includes a plurality of gates and a dielectric gap filling material with a pre-determined aspect ratio that is between the gates. The device further includes an etch resistant nitride layer that is configured to maintain the aspect ratio of the dielectric gap filling material during fabrication of the device and is disposed above the dielectric gap filling material and between the plurality of gates. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11152267-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10056378-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9905671-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8927406-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10861752-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10490458-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11545400-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11011384-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017223323-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9171753-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102014119156-B4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9570318-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016218102-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9859275-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102018101016-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102018101016-B4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3770972-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10707115-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014191299-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013210222-A1 |
priorityDate |
2012-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |