http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013303421-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2013-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3676b2153c03c5f0526eb572f3e72318 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eee565e0921f3f7c3d4efebf21724b53 |
| publicationDate | 2013-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2013303421-A1 |
| titleOfInvention | Photoresist stripping technique |
| abstract | Photoresist stripping solutions are disclosed. An exemplary solution includes an organic solvent and an organic base, wherein the organic base is represented by the formula: n n n n n n n n n n wherein R 1 —Z 1 , R 2 —Z 2 , R 3 —Z 3 , and R 4 —Z 4 are steric hindered functional groups, and further wherein R 1 , R 2 , R 3 , and R 4 are each an alkyl group and Z 1 , Z 2 , Z 3 , and Z 4 are each a pendant group selected from the group consisting of —Cl, —Br, —I, —NO 2 , —SO 3 —, —H—, —CN, —NCO, —OCN, —CO 2 —, —OC(O)CR*, —SR*, —SO 2 N(R*) 2 , —SO 2 R*, —OC(O)R*, —C(O)R*, —Si(R*) 3 , and an epoxyl group. |
| priorityDate | 2009-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 74.