http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013285047-A1

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filingDate 2013-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5563e68c7c10017c83fb15b655a22d87
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publicationDate 2013-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2013285047-A1
titleOfInvention Semiconductor device
abstract A transistor including an oxide semiconductor film, in which the threshold voltage is prevented from being a negative value, is provided. A high quality semiconductor device having the transistor including an oxide semiconductor film is provided. A transistor includes an oxide semiconductor film having first to third regions. The top surface of the oxide semiconductor film in the first region is in contact with a source electrode or a drain electrode. The top surface of the oxide semiconductor film in the second region is in contact with a protective insulating film. The thickness of the second region is substantially uniform and smaller than the maximum thickness of the first region. The top surface and a side surface of the oxide semiconductor film in the third region are in contact with the protective insulating film.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113388823-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10396096-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018175072-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10068906-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9865788-B2
priorityDate 2012-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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